1.Yilin Yang, Dongli Zhang, Mingxiang Wang, Lei Lu, and Man Wong, “Suppressed Degradation of Elevated-Metal Metal-Oxide Thin-Film Transistors under Bipolar Gate Pulse Stress,” IEEE Electron Device Letters, vol. 39(5), pp. 707-710, May 2018.
2.Dongli Zhang, Mingxiang Wang, Man Wong, and Hoi-Sing Kwok, “Crystallization of Amorphous Silicon beyond the Crystallized Polycrystalline Silicon Region Induced by Metal Nickel,” Chinese Physics B, vol.26(1), pp.016601, Jan. 2017.
3.Dongli Zhang, Mingxiang Wang, Huaisheng Wang, and Qi Shan, “Investigations on the Gate-Induced Drain Leakage Current of Polycrystalline-Silicon Thin-Film Transistor and its Suppression with Drain Bias Sweep,” IEEE Transactions on Electron Devices, vol.63(4), pp.1572-1577, Mar. 2016.
4.Dongli Zhang, Mingxiang Wang and Kai Sun, “Low Frequency Noise Characterization and Signal-to-Noise Ratio Optimization for Silicon Hall Cross Sensors,” IEEE Journal of Electron Devices Society, vol.3(4), pp.365-370, July 2015.
5.Dongli Zhang, Mingxiang Wang and Xiaowei Lu, “Two-Stage Degradation of P-Type Polycrystalline Silicon Thin-Film Transistors under Dynamic Positive Bias Temperature Stress,” IEEE Transactions on Electron Devices, vol.61(11), pp.3751-3756, Nov. 2014.